9 okt 2019
Sr Engineer R&D Source Mask Optimization
| Branche | Zie onder |
| Dienstverband | Zie onder |
| Uren | Zie onder |
| Locatie | |
| Opleidingsniveau | Zie onder |
| Organisatie | ASML |
| Contactpersoon | Zie onder |
Informatie
As a member of the Source-Mask Optimization R&D team, the job entails large-scale C++ and Python software development that co-optimizes the light source, lenses and mirrors, and...
Introduction
ASML US brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world’s leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics. Our headquarters are in Veldhoven, the Netherlands, and we have 18 office locations around the United States including main offices in Chandler Arizona, San Jose and San Diego California, Wilton Connecticut, and Hillsboro Oregon.
Job Mission
The job's primary responsibilities include the modeling of complex optical phenomena in ASML photolithography scanners and the optimization of scanner configuration and photomask layout to enable the continuing shrink of semiconductor devices through resolution enhancement, to match the imaging performance across a fleet of scanners, and to assist in future scanner design.
Job Description
As a member of the Source-Mask Optimization R&D team, the job entails large-scale C++ and Python software development that co-optimizes the light source, lenses and mirrors, and dose and focus settings within the ASML family of XT, NXT, and NXE scanners, as well as the photomask patterns, sub-resolution assist features, and their target design. The job requires an understanding of the optical physics and photoresist chemistry, modern optimization and machine learning algorithms, and C++/Python software design.
Education
Ph.D. or M.S. in physics, physical chemistry, electrical engineering, applied mathematics, computer science, or related areas.
Experience
This position primarily works in an office environment. It requires frequent sitting, standing and walking. Daily use of a computer is required. May stand for extended periods when facilitating meetings. The physical demands of the position described herein are essential functions of the job and employees must be able to successfully perform these tasks for extended periods. Reasonable accommodations may be made for those individuals with real or perceived disabilities to perform the essential functions of the job described.
Other information
EEO/AA (W/M/Vets/Disability) Employer
Introduction
ASML US brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world’s leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics. Our headquarters are in Veldhoven, the Netherlands, and we have 18 office locations around the United States including main offices in Chandler Arizona, San Jose and San Diego California, Wilton Connecticut, and Hillsboro Oregon.
Job Mission
The job's primary responsibilities include the modeling of complex optical phenomena in ASML photolithography scanners and the optimization of scanner configuration and photomask layout to enable the continuing shrink of semiconductor devices through resolution enhancement, to match the imaging performance across a fleet of scanners, and to assist in future scanner design.
Job Description
As a member of the Source-Mask Optimization R&D team, the job entails large-scale C++ and Python software development that co-optimizes the light source, lenses and mirrors, and dose and focus settings within the ASML family of XT, NXT, and NXE scanners, as well as the photomask patterns, sub-resolution assist features, and their target design. The job requires an understanding of the optical physics and photoresist chemistry, modern optimization and machine learning algorithms, and C++/Python software design.
Education
Ph.D. or M.S. in physics, physical chemistry, electrical engineering, applied mathematics, computer science, or related areas.
Experience
- Knowledge of optics, semiconductor lithography, or IC design
- Experience in any of the following: scientific simulation, numerical methods, image processing, optimization, computational geometry, machine learning, data science
- Experience in C++, Python, or other object-oriented software development, with solid undertanding of data structures and algorithms
- Experience in developing and debugging multi-threaded/parallel applications
- Familiar with UNIX environment and scripting languages
- Strong verbal and written communication skills
- Proactive with a strong sense of ownership
- Self-motivated
This position primarily works in an office environment. It requires frequent sitting, standing and walking. Daily use of a computer is required. May stand for extended periods when facilitating meetings. The physical demands of the position described herein are essential functions of the job and employees must be able to successfully perform these tasks for extended periods. Reasonable accommodations may be made for those individuals with real or perceived disabilities to perform the essential functions of the job described.
Other information
EEO/AA (W/M/Vets/Disability) Employer
Omschrijving
As a member of the Source-Mask Optimization R&D team, the job entails large-scale C++ and Python software development that co-optimizes the light source, lenses and mirrors, and...
Introduction
ASML US brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world’s leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics. Our headquarters are in Veldhoven, the Netherlands, and we have 18 office locations around the United States including main offices in Chandler Arizona, San Jose and San Diego California, Wilton Connecticut, and Hillsboro Oregon.
Job Mission
The job's primary responsibilities include the modeling of complex optical phenomena in ASML photolithography scanners and the optimization of scanner configuration and photomask layout to enable the continuing shrink of semiconductor devices through resolution enhancement, to match the imaging performance across a fleet of scanners, and to assist in future scanner design.
Job Description
As a member of the Source-Mask Optimization R&D team, the job entails large-scale C++ and Python software development that co-optimizes the light source, lenses and mirrors, and dose and focus settings within the ASML family of XT, NXT, and NXE scanners, as well as the photomask patterns, sub-resolution assist features, and their target design. The job requires an understanding of the optical physics and photoresist chemistry, modern optimization and machine learning algorithms, and C++/Python software design.
Education
Ph.D. or M.S. in physics, physical chemistry, electrical engineering, applied mathematics, computer science, or related areas.
Experience
This position primarily works in an office environment. It requires frequent sitting, standing and walking. Daily use of a computer is required. May stand for extended periods when facilitating meetings. The physical demands of the position described herein are essential functions of the job and employees must be able to successfully perform these tasks for extended periods. Reasonable accommodations may be made for those individuals with real or perceived disabilities to perform the essential functions of the job described.
Other information
EEO/AA (W/M/Vets/Disability) Employer
Introduction
ASML US brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world’s leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics. Our headquarters are in Veldhoven, the Netherlands, and we have 18 office locations around the United States including main offices in Chandler Arizona, San Jose and San Diego California, Wilton Connecticut, and Hillsboro Oregon.
Job Mission
The job's primary responsibilities include the modeling of complex optical phenomena in ASML photolithography scanners and the optimization of scanner configuration and photomask layout to enable the continuing shrink of semiconductor devices through resolution enhancement, to match the imaging performance across a fleet of scanners, and to assist in future scanner design.
Job Description
As a member of the Source-Mask Optimization R&D team, the job entails large-scale C++ and Python software development that co-optimizes the light source, lenses and mirrors, and dose and focus settings within the ASML family of XT, NXT, and NXE scanners, as well as the photomask patterns, sub-resolution assist features, and their target design. The job requires an understanding of the optical physics and photoresist chemistry, modern optimization and machine learning algorithms, and C++/Python software design.
Education
Ph.D. or M.S. in physics, physical chemistry, electrical engineering, applied mathematics, computer science, or related areas.
Experience
- Knowledge of optics, semiconductor lithography, or IC design
- Experience in any of the following: scientific simulation, numerical methods, image processing, optimization, computational geometry, machine learning, data science
- Experience in C++, Python, or other object-oriented software development, with solid undertanding of data structures and algorithms
- Experience in developing and debugging multi-threaded/parallel applications
- Familiar with UNIX environment and scripting languages
- Strong verbal and written communication skills
- Proactive with a strong sense of ownership
- Self-motivated
This position primarily works in an office environment. It requires frequent sitting, standing and walking. Daily use of a computer is required. May stand for extended periods when facilitating meetings. The physical demands of the position described herein are essential functions of the job and employees must be able to successfully perform these tasks for extended periods. Reasonable accommodations may be made for those individuals with real or perceived disabilities to perform the essential functions of the job described.
Other information
EEO/AA (W/M/Vets/Disability) Employer
